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An Improved YOLOv7-Tiny-Based Algorithm for Wafer Surface Defect Detection

Wafer surface defect detection is a critical component in the chip manufacturing process. To address the shortcomings of manual inspection and the limitations of existing machine learning methods, this paper proposes a wafer defect detection algorithm based on an improved YOLOv7-tiny. First, a coord...

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Príomhchruthaitheoirí: Mengyun Li, Xueying Wang, Hongtao Zhang, Xiaofeng Hu
Formáid: Artigo
Teanga:Inglês
Foilsithe / Cruthaithe: IEEE 2025-01-01
Sraith:IEEE Access
Ábhair:
Rochtain ar líne:https://ieeexplore.ieee.org/document/10836686/
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