An Adjustment Strategy for Tilted Moiré Fringes via Deep Q-Network

Overlay accuracy, one of the three fundamental indicators of lithography, is directly influenced by alignment precision. During the alignment process based on the Moiré fringe method, a slight angular misalignment between the mask and wafer will cause the Moiré fringes to tilt, thereby affecting the...

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Hlavní autoři:	Chuan Jin, Dajie Yu, Haifeng Sun, Junbo Liu, Ji Zhou, Jian Wang
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	MDPI AG 2024-07-01
Edice:	Photonics
Témata:	lithography alignment deep reinforcement learning Moiré fringe
On-line přístup:	https://www.mdpi.com/2304-6732/11/7/666
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