An Adjustment Strategy for Tilted Moiré Fringes via Deep Q-Network
Overlay accuracy, one of the three fundamental indicators of lithography, is directly influenced by alignment precision. During the alignment process based on the Moiré fringe method, a slight angular misalignment between the mask and wafer will cause the Moiré fringes to tilt, thereby affecting the...
Kaydedildi:
| Asıl Yazarlar: | , , , , , |
|---|---|
| Materyal Türü: | Artigo |
| Dil: | Inglês |
| Baskı/Yayın Bilgisi: |
MDPI AG
2024-07-01
|
| Seri Bilgileri: | Photonics |
| Konular: | |
| Online Erişim: | https://www.mdpi.com/2304-6732/11/7/666 |
| Etiketler: |
Etiket eklenmemiş, İlk siz ekleyin!
|