DOF Enhanced via the Multi-Wavelength Method for the Moiré Fringe-Based Alignment
Alignment systems are core subsystems of lithography, which directly affect the overlay accuracy of the lithography process. The Moiré fringe-based alignment method has the advantages of high precision and low complexity. However, the precision of this method is highly sensitive to variations in the...
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| Główni autorzy: | , , , , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
MDPI AG
2025-03-01
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| Seria: | Micromachines |
| Hasła przedmiotowe: | |
| Dostęp online: | https://www.mdpi.com/2072-666X/16/3/356 |
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