Composition design and optimization of electrochemical mechanical polishing slurry for single crystal SiC
Objectives: Single crystal silicon carbide (SiC) is known for its high hardness and high chemical inertness, making it chanllenging to process effectively using traditional chemical mechanical polishing (CMP) methods. CMP often struggles to balance processing efficiency and surface quality for SiC....
Αποθηκεύτηκε σε:
| Κύριοι συγγραφείς: | , , , , |
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| Μορφή: | Artigo |
| Γλώσσα: | Chinês |
| Έκδοση: |
Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd.
2024-10-01
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| Σειρά: | Jin'gangshi yu moliao moju gongcheng |
| Θέματα: | |
| Διαθέσιμο Online: | http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2023.0246 |
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