Composition design and optimization of electrochemical mechanical polishing slurry for single crystal SiC
Objectives: Single crystal silicon carbide (SiC) is known for its high hardness and high chemical inertness, making it chanllenging to process effectively using traditional chemical mechanical polishing (CMP) methods. CMP often struggles to balance processing efficiency and surface quality for SiC....
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| Autori principali: | , , , , |
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| Natura: | Artigo |
| Lingua: | Chinês |
| Pubblicazione: |
Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd.
2024-10-01
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| Serie: | Jin'gangshi yu moliao moju gongcheng |
| Soggetti: | |
| Accesso online: | http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2023.0246 |
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