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P–i–n photodetector with active GePb layer grown by sputtering epitaxy

In this paper, single-crystal GePb films were obtained by magnetron sputtering with high substrate temperature and rapid deposition rate. The GePb films have high crystalline qualities and smooth surface. The Pb content reached 1.29% and no segregation was observed. Based on this, a GePb based p–i–n...

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Detalhes bibliográficos
Principais autores: Jiulong Yu, Guangyang Lin, Shilong Xia, Wei Huang, Tianwei Yang, Jinlong Jiao, Xiangquan Liu, Songyan Chen, Cheng Li, Jun Zheng, Jun Li
Formato: Artigo
Idioma:Inglês
Publicado em: IOP Publishing 2024-01-01
coleção:Applied Physics Express
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Acesso em linha:https://doi.org/10.35848/1882-0786/ad3dc1
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