Characterization of Ti/SnO<sub>2</sub> Interface by X-ray Photoelectron Spectroscopy
The Ti/SnO<sub>2</sub> interface has been investigated in situ via the technique of x-ray photoelectron spectroscopy. Thin films (in the range from 0.3 to 1.1 nm) of titanium were deposited on SnO<sub>2</sub> substrates via the e-beam technique. The deposition was carried out at two different substr...
Uloženo v:
| Hlavní autoři: | , |
|---|---|
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
MDPI AG
2022-01-01
|
| Edice: | Nanomaterials |
| Témata: | |
| On-line přístup: | https://www.mdpi.com/2079-4991/12/2/202 |
| Tagy: |
Žádné tagy, Buďte první, kdo vytvoří štítek k tomuto záznamu!
|