Characterization of Ti/SnO<sub>2</sub> Interface by X-ray Photoelectron Spectroscopy
The Ti/SnO<sub>2</sub> interface has been investigated in situ via the technique of x-ray photoelectron spectroscopy. Thin films (in the range from 0.3 to 1.1 nm) of titanium were deposited on SnO<sub>2</sub> substrates via the e-beam technique. The deposition was carried out at two different substr...
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| Principais autores: | , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI AG
2022-01-01
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| coleção: | Nanomaterials |
| Assuntos: | |
| Acesso em linha: | https://www.mdpi.com/2079-4991/12/2/202 |
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