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Structural, optical and morphological properties of InxGa1-xAs layers o btained by RF magnetron sputtering

Indium gallium arsenide layers (In x Ga 1 - x As) were prepared on Silicon (100) and glass substrates in an argon atmosphere by R.F. magnetron sputtering. The growth temperature was 580 °C and high purity targets of gallium arsenide and indium were used. The effects due to the RF power for the In...

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Sparad:
Bibliografiska uppgifter
I publikationen:Superficies y vacío
Huvudupphov: A. Pulzara-Mora, J. Montes-Monsalve, R. Bernal-Correa, A. Morales-Acevedo, S. Gallardo-Hernández, M. López-López
Materialtyp: Artigo
Språk:Inglês
Utgiven: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 2016
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Länkar:https://www.redalyc.org/articulo.oa?id=94246523001
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