Effects of temperature and deposition time on the RF- sputtered CdTe films preparation
In this work, CdTe thin films were deposited by rf-sputtering at different substrate temperatures (room temperature (RT), 100, 150, 200, and 250 °C) and deposition times (30, 60, and 90 min). The applied power and vacuum pressure were maintained fixed for all depositions. A mean value of 18 .5 nm/s...
Guardado en:
| Publicado en: | Superficies y vacío |
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| Autores principales: | , , , , , |
| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2014
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| Materias: | |
| Acceso en línea: | https://www.redalyc.org/articulo.oa?id=94231175004 |
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