Ion beam sputter deposition of low work function and GMR materials
Ion beam Sputter deposition (IBSD) has been under development for a number of years due to the flexibility it provides in the deposition of novel thin film materials. One of the unique characteristics of IBSD is the ability to deposit multicomponent or multilayered materials using a multi-target sin...
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| Pubblicato in: | Superficies y vacío |
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| Autori principali: | , , , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Soggetti: | |
| Accesso online: | https://www.redalyc.org/articulo.oa?id=94211324002 |
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