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Deviation from thermodynamic equilibrium at the initial stage of the GaN growth by metalorganic chemical vapor deposition (MOCVD)

LT-MOCVD growth runs of GaN are conventionally used for the formation of the nucleation layers prior to epitaxial growth of GaN is substantially determined by the low temperature (LT) grown layers. Therefore, study of the LT runs is very important. One of the main concerns of the crystal growth is i...

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Detalhes bibliográficos
Publicado no:Superficies y vacío
Main Authors: V.A. Elyukhin, G. García Salgado, R. Peña Sierra
Formato: Artigo
Idioma:Inglês
Publicado em: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 2001
Assuntos:
GaN
Acesso em linha:https://www.redalyc.org/articulo.oa?id=94201325
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