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On metastable properties of plasma treated amorphous Si:H films
Amorphous hydrogenated silicon (a-Si:H) is well known as a semiconductor with metastable properties. This paper deals with structural and electrical properties of a-Si:H surfaces in virgin state as well as on low-energy ion exposition. Two ion sources were used, namely a monoenergetic ion beam produ...
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| Publicado no: | Superficies y vacío |
|---|---|
| Main Authors: | , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2001
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| Assuntos: | |
| Acesso em linha: | https://www.redalyc.org/articulo.oa?id=94201309 |
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