XPS analysis of oxidation states of Te in CdTe oxide films grown by rf sputtering with an Ar -NH3 plasma
Using rf-sputtering, CdTe oxide films were grown on glass substrates in a controlled plasma of Ar-NH3. The elementalconcentration and oxidation state of Te were determined by x-ray photoelectron spectroscopy. When the NH3 partialpressure increases from 3´10-6 to 1´10-4 Torr, the relative atomic conc...
Bewaard in:
| Gepubliceerd in: | Superficies y vacío |
|---|---|
| Hoofdauteurs: | , , , , , |
| Formaat: | Artigo |
| Taal: | Inglês |
| Gepubliceerd in: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2001
|
| Onderwerpen: | |
| Online toegang: | https://www.redalyc.org/articulo.oa?id=94201203 |
| Tags: |
Geen labels, Wees de eerste die dit record labelt!
|