Properties of DLC and CNx PECVD coatings
Carbon based thin films have been prepared by PECVD method. Silicon and steel substrates were used for thin films preparation. Deposition was carried out under various conditions. Plasma was generated by RF (13.56 MHz) discharge. Investigation of theproperties of deposited thin films has been carrie...
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| Publicado en: | Superficies y vacío |
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| Autores principales: | , , , , , |
| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Materias: | |
| Acceso en línea: | https://www.redalyc.org/articulo.oa?id=94200933 |
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