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Highly Ordered Amorphous Silicon-Carbon Alloys Obtained by RF PECVD

We have shown that close to stoichiometry RF PECVD amorphous silicon carbon alloys deposited under silane starving plasma conditions exhibit a tendency towards c-SiC chemical order. Motivated by this trend, we further explore the effect of increasing RF power and H2 dilution of the gaseous mixtures,...

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Bibliographic Details
Published in:Brazilian Journal of Physics
Main Authors: I. Pereyra, C. A. Villacorta, M.N.P. Carreño, R.J. Prado, M.C.A. Fantini
Format: Artigo
Language:Inglês
Published: Sociedade Brasileira de Física 2000
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Online Access:https://www.redalyc.org/articulo.oa?id=46413500009
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