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Ion beam irradiation of thin CaF2 films: A study of lithographic properties
The technological track to ever smaller devices in very and ultra high scale integration schemes with feature sizes lowerthan 1 m, carries classical photolithographic methods to physical limits, and is claiming a transition to lowerwavelength or particle irradiation. New resist materials and exposur...
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| Pubblicato in: | Superficies y vacío |
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| Autori principali: | , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Soggetti: | |
| Accesso online: | https://www.redalyc.org/articulo.oa?id=94200907 |
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