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Growth of AlxGa1¡xAs/GaAs structures for single quantum wells by solid arsenic MOCVD system

The results obtained from the growth and characterization of AlXGa1¡XAs/GaAs multilayer structures by a Metalorganic Chemical VaporDeposition (MOCVD) system based on metallic arsenic are presented. The MOCVD system was adapted in order to be used for thegrowth of quantum wells structures. Our main g...

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Pubblicato in:Revista Mexicana de Física
Autori principali: S. Manrique Moreno, R. Castillo Ojeda, M. Galván Arellano, R. Peña-Sierra
Natura: Artigo
Lingua:Inglês
Pubblicazione: Sociedad Mexicana de Física A.C. 2007
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Accesso online:https://www.redalyc.org/articulo.oa?id=57053603
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