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Transistor characteristics of zinc oxide active layers at various zinc acetate dihydrate solution concentrations of zinc oxide thin-film

This paper presents a technique involving a sol-gel deposition method applied to the deposition of zinc oxide thin film for a transistor as a semiconductor layer. This method was used for manufacturing the essential thin films of II-VI semiconductors. Zinc oxide (ZnO) bottom-gate (BG) thin-film tran...

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Detalles Bibliográficos
Publicado en:Journal of Applied Research and Technology
Autor Principal: You H.C.
Formato: Artigo
Idioma:Inglês
Publicado: Universidad Nacional Autónoma de México 2015
Assuntos:
ZnO
Acceso en liña:https://www.redalyc.org/articulo.oa?id=47439895015
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