Production and Characterization of Indium Oxide and Indium Nitride
Thin films of indium oxide 200 nm thick and indium nitride 150 nm thick were produced by reactive sputteringdeposition onto soda lime substrates. The Indium cathode was kept under vacuum attached to a high voltagedc. The InxOy films were obtained in argon-oxygen mixture with total pressure between 2...
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| Veröffentlicht in: | Brazilian Journal of Physics |
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| Hauptverfasser: | , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Sociedade Brasileira de Física
2006
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| Schlagworte: | |
| Online-Zugang: | https://www.redalyc.org/articulo.oa?id=46436558 |
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