Production and Characterization of Indium Oxide and Indium Nitride

Thin films of indium oxide 200 nm thick and indium nitride 150 nm thick were produced by reactive sputteringdeposition onto soda lime substrates. The Indium cathode was kept under vacuum attached to a high voltagedc. The InxOy films were obtained in argon-oxygen mixture with total pressure between 2...

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Detalhes bibliográficos
Publicado no:Brazilian Journal of Physics
Main Authors: Luis C. Jimenez B., Henry A. Méndez P., Beynor A. Páez S., María E. Ramírez O., Hernán Rodríguez H.
Formato: Artigo
Idioma:Inglês
Publicado em: Sociedade Brasileira de Física 2006
Assuntos:
Física, Astronomía y Matemáticas
Indium oxide
Indium nitride
Thermoelectric power
Scattering mechanisms
Acesso em linha:https://www.redalyc.org/articulo.oa?id=46436558
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