Production and Characterization of Indium Oxide and Indium Nitride

Thin films of indium oxide 200 nm thick and indium nitride 150 nm thick were produced by reactive sputteringdeposition onto soda lime substrates. The Indium cathode was kept under vacuum attached to a high voltagedc. The InxOy films were obtained in argon-oxygen mixture with total pressure between 2...

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Dettagli Bibliografici
Pubblicato in:Brazilian Journal of Physics
Autori principali: Luis C. Jimenez B., Henry A. Méndez P., Beynor A. Páez S., María E. Ramírez O., Hernán Rodríguez H.
Natura: Artigo
Lingua:Inglês
Pubblicazione: Sociedade Brasileira de Física 2006
Soggetti:
Física, Astronomía y Matemáticas
Indium oxide
Indium nitride
Thermoelectric power
Scattering mechanisms
Accesso online:https://www.redalyc.org/articulo.oa?id=46436558
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