Production and Characterization of Indium Oxide and Indium Nitride

Thin films of indium oxide 200 nm thick and indium nitride 150 nm thick were produced by reactive sputteringdeposition onto soda lime substrates. The Indium cathode was kept under vacuum attached to a high voltagedc. The InxOy films were obtained in argon-oxygen mixture with total pressure between 2...

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Detaylı Bibliyografya
Yayımlandı:Brazilian Journal of Physics
Asıl Yazarlar: Luis C. Jimenez B., Henry A. Méndez P., Beynor A. Páez S., María E. Ramírez O., Hernán Rodríguez H.
Materyal Türü: Artigo
Dil:Inglês
Baskı/Yayın Bilgisi: Sociedade Brasileira de Física 2006
Konular:
Física, Astronomía y Matemáticas
Indium oxide
Indium nitride
Thermoelectric power
Scattering mechanisms
Online Erişim:https://www.redalyc.org/articulo.oa?id=46436558
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