लोड हो रहा है...
Highly Ordered Amorphous Silicon-Carbon Alloys Obtained by RF PECVD
We have shown that close to stoichiometry RF PECVD amorphous silicon carbon alloys deposited under silane starving plasma conditions exhibit a tendency towards c-SiC chemical order. Motivated by this trend, we further explore the effect of increasing RF power and H2 dilution of the gaseous mixtures,...
में बचाया:
में प्रकाशित: | Brazilian Journal of Physics |
---|---|
मुख्य लेखकों: | , , , , |
स्वरूप: | Artigo |
भाषा: | Inglês |
प्रकाशित: |
Sociedade Brasileira de Física
2000
|
विषय: | |
ऑनलाइन पहुंच: | https://www.redalyc.org/articulo.oa?id=46413500009 |
टैग : |
टैग जोड़ें
कोई टैग नहीं, इस रिकॉर्ड को टैग करने वाले पहले व्यक्ति बनें!
|