Wird geladen...
The Effect of Nitrogen Incorporation on the Optical Properties of Si-Rich a-SiCx Films Deposited by VHF PECVD
The influence of N incorporation on the optical properties of Si-rich a-SiC(x) films deposited by very high-frequency plasma-enhanced chemical vapor deposition (VHF PECVD) was investigated. The increase in N content in the films was found to cause a remarkable enhancement in photoluminescence (PL)....
Gespeichert in:
| Veröffentlicht in: | Micromachines (Basel) |
|---|---|
| Hauptverfasser: | , , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
MDPI
2021
|
| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8228809/ https://ncbi.nlm.nih.gov/pubmed/34070734 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12060637 |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|