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Structural and optical characteristics determined by the sputtering deposition conditions of oxide thin films

The influence of film thickness on the structural and optical properties of silicon dioxide (SiO(2)) and zinc oxide (ZnO) thin films deposited by radio frequency magnetron sputtering on quartz substrates was investigated. The deposition conditions were optimized to achieve stoichiometric thin films....

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Detalhes bibliográficos
Publicado no:Beilstein J Nanotechnol
Main Authors: Prepelita, Petronela, Garoi, Florin, Craciun, Valentin
Formato: Artigo
Idioma:Inglês
Publicado em: Beilstein-Institut 2021
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC8077636/
https://ncbi.nlm.nih.gov/pubmed/33968560
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.12.29
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