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Structural and optical characteristics determined by the sputtering deposition conditions of oxide thin films
The influence of film thickness on the structural and optical properties of silicon dioxide (SiO(2)) and zinc oxide (ZnO) thin films deposited by radio frequency magnetron sputtering on quartz substrates was investigated. The deposition conditions were optimized to achieve stoichiometric thin films....
में बचाया:
| में प्रकाशित: | Beilstein J Nanotechnol |
|---|---|
| मुख्य लेखकों: | , , |
| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
Beilstein-Institut
2021
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| विषय: | |
| ऑनलाइन पहुंच: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8077636/ https://ncbi.nlm.nih.gov/pubmed/33968560 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.12.29 |
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