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Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...

Täydet tiedot

Tallennettuna:
Bibliografiset tiedot
Julkaisussa:Micromachines (Basel)
Päätekijät: Seewald, Lukas Matthias, Winkler, Robert, Kothleitner, Gerald, Plank, Harald
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: MDPI 2021
Aiheet:
Linkit:https://ncbi.nlm.nih.gov/pmc/articles/PMC7911092/
https://ncbi.nlm.nih.gov/pubmed/33499214
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12020115
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