A carregar...

Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:Micromachines (Basel)
Main Authors: Seewald, Lukas Matthias, Winkler, Robert, Kothleitner, Gerald, Plank, Harald
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2021
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7911092/
https://ncbi.nlm.nih.gov/pubmed/33499214
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12020115
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!