Carregant...
Expanding 3D Nanoprinting Performance by Blurring the Electron Beam
Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...
Guardat en:
| Publicat a: | Micromachines (Basel) |
|---|---|
| Autors principals: | , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI
2021
|
| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7911092/ https://ncbi.nlm.nih.gov/pubmed/33499214 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12020115 |
| Etiquetes: |
Afegir etiqueta
Sense etiquetes, Sigues el primer a etiquetar aquest registre!
|