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Expanding 3D Nanoprinting Performance by Blurring the Electron Beam
Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...
Gorde:
| Argitaratua izan da: | Micromachines (Basel) |
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| Egile Nagusiak: | , , , |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
MDPI
2021
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| Gaiak: | |
| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7911092/ https://ncbi.nlm.nih.gov/pubmed/33499214 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12020115 |
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