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Expanding 3D Nanoprinting Performance by Blurring the Electron Beam
Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...
Αποθηκεύτηκε σε:
| Τόπος έκδοσης: | Micromachines (Basel) |
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| Κύριοι συγγραφείς: | , , , |
| Μορφή: | Artigo |
| Γλώσσα: | Inglês |
| Έκδοση: |
MDPI
2021
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| Θέματα: | |
| Διαθέσιμο Online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7911092/ https://ncbi.nlm.nih.gov/pubmed/33499214 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12020115 |
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