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Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...

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Shranjeno v:
Bibliografske podrobnosti
izdano v:Micromachines (Basel)
Main Authors: Seewald, Lukas Matthias, Winkler, Robert, Kothleitner, Gerald, Plank, Harald
Format: Artigo
Jezik:Inglês
Izdano: MDPI 2021
Teme:
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC7911092/
https://ncbi.nlm.nih.gov/pubmed/33499214
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12020115
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