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Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching
The key optical components of X-ray grating interferometry are gratings, whose profile requirements play the most critical role in acquiring high quality images. The difficulty of etching grating lines with high aspect ratios when the pitch is in the range of a few micrometers has greatly limited im...
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| Publicat a: | Micromachines (Basel) |
|---|---|
| Autors principals: | , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI
2020
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7570153/ https://ncbi.nlm.nih.gov/pubmed/32961900 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi11090864 |
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