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Formation of Thin NiGe Films by Magnetron Sputtering and Flash Lamp Annealing
The nickel monogermanide (NiGe) phase is known for its electrical properties such as low ohmic and low contact resistance in group-IV-based electronics. In this work, thin films of nickel germanides (Ni–Ge) were formed by magnetron sputtering followed by flash lamp annealing (FLA). The formation of...
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| Publicado no: | Nanomaterials (Basel) |
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| Main Authors: | , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7221967/ https://ncbi.nlm.nih.gov/pubmed/32244356 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10040648 |
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