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Formation of Thin NiGe Films by Magnetron Sputtering and Flash Lamp Annealing

The nickel monogermanide (NiGe) phase is known for its electrical properties such as low ohmic and low contact resistance in group-IV-based electronics. In this work, thin films of nickel germanides (Ni–Ge) were formed by magnetron sputtering followed by flash lamp annealing (FLA). The formation of...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Begeza, Viktor, Mehner, Erik, Stöcker, Hartmut, Xie, Yufang, García, Alejandro, Hübner, Rene, Erb, Denise, Zhou, Shengqiang, Rebohle, Lars
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7221967/
https://ncbi.nlm.nih.gov/pubmed/32244356
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10040648
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