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Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH(3)
Transition metal nitrides, like titanium nitride (TiN), are promising alternative plasmonic materials. Here we demonstrate a low temperature plasma-enhanced atomic layer deposition (PE-ALD) of non-stoichiometric TiN(0.71) on lattice-matched and -mismatched substrates. The TiN was found to be optical...
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| 出版年: | Materials (Basel) |
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| 主要な著者: | , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
MDPI
2020
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7084610/ https://ncbi.nlm.nih.gov/pubmed/32120834 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma13051058 |
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