ロード中...
ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition
For the analysis of thin films, with high aspect ratio (HAR) structures, time-of-flight secondary ion mass spectrometry (ToF-SIMS) overcomes several challenges in comparison to other frequently used techniques such as electron microscopy. The research presented herein focuses on two different kinds...
保存先:
| 出版年: | Nanomaterials (Basel) |
|---|---|
| 主要な著者: | , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
MDPI
2019
|
| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6669757/ https://ncbi.nlm.nih.gov/pubmed/31331020 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano9071035 |
| タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|