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Fabrication of Tapered Micropillars with High Aspect-Ratio Based on Deep X-ray Lithography

In this study, a fabrication method of tapered microstructures with high aspect ratio was proposed by deep X-ray lithography. Tapered microstructures with several hundred micrometers and high aspect ratio are demanded owing to the high applicability in the fields of various microelectromechanical sy...

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書目詳細資料
發表在:Materials (Basel)
Main Authors: Park, Jae Man, Kim, Jong Hyun, Han, Jun Sae, Shin, Da Seul, Park, Sung Cheol, Son, Seong Ho, Park, Seong Jin
格式: Artigo
語言:Inglês
出版: MDPI 2019
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在線閱讀:https://ncbi.nlm.nih.gov/pmc/articles/PMC6651585/
https://ncbi.nlm.nih.gov/pubmed/31247998
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma12132056
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