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Fabrication of Tapered Micropillars with High Aspect-Ratio Based on Deep X-ray Lithography
In this study, a fabrication method of tapered microstructures with high aspect ratio was proposed by deep X-ray lithography. Tapered microstructures with several hundred micrometers and high aspect ratio are demanded owing to the high applicability in the fields of various microelectromechanical sy...
में बचाया:
| में प्रकाशित: | Materials (Basel) |
|---|---|
| मुख्य लेखकों: | , , , , , , |
| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
MDPI
2019
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| विषय: | |
| ऑनलाइन पहुंच: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6651585/ https://ncbi.nlm.nih.gov/pubmed/31247998 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma12132056 |
| टैग : |
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