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Wafer-scale fabrication of high-aspect ratio nanochannels based on edge-lithography technique
This paper introduced a wafer-scale fabrication approach for the preparation of nanochannels with high-aspect ratio (the ratio of the channel depth to its width). Edge lithography was used to pattern nanogaps in an aluminum film, which was functioned as deep reactive ion etching mask thereafter to f...
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| Main Authors: | , , , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American Institute of Physics
2012
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3293387/ https://ncbi.nlm.nih.gov/pubmed/22396721 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.3683164 |
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