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The role of Si in GaN/AlN/Si(111) plasma assisted molecular beam epitaxy: polarity and inversion()

The microstructure, polarity and Si distribution in AlN/GaN layers grown by plasma assisted molecular beam epitaxy (PAMBE) on Si(111) was assessed by scanning transmission electron microscopy (STEM). Samples grown under both metal- and nitrogen-rich conditions contained defects at the AlN/Si interfa...

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Bibliografiska uppgifter
I publikationen:Jpn J Appl Phys (2008)
Huvudupphovsmän: Roshko, Alexana, Brubaker, Matthew, Blanchard, Paul, Harvey, Todd, Bertness, Kris
Materialtyp: Artigo
Språk:Inglês
Publicerad: 2019
Ämnen:
Länkar:https://ncbi.nlm.nih.gov/pmc/articles/PMC6605072/
https://ncbi.nlm.nih.gov/pubmed/31276121
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.7567/1347-4065/ab1124
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