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Growth of GaN nanowall network on Si (111) substrate by molecular beam epitaxy

GaN nanowall network was epitaxially grown on Si (111) substrate by molecular beam epitaxy. GaN nanowalls overlap and interlace with one another, together with large numbers of holes, forming a continuous porous GaN nanowall network. The width of the GaN nanowall can be controlled, ranging from 30 t...

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Bibliografiske detaljer
Main Authors: Zhong, Aihua, Hane, Kazuhiro
Format: Artigo
Sprog:Inglês
Udgivet: Springer 2012
Fag:
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC3564710/
https://ncbi.nlm.nih.gov/pubmed/23270331
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-686
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