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From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity†
[Image: see text] Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently gaining momentum in semiconductor processing, because of the increasing need for eliminating the edge placement errors of top-down processing. Moreover, area-selective ALD offers new opportunitie...
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| Pubblicato in: | Chem Mater |
|---|---|
| Autori principali: | , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
American Chemical
Society
2018
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| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6369656/ https://ncbi.nlm.nih.gov/pubmed/30774194 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.chemmater.8b03454 |
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