Phosphorus monolayer doping (MLD) of silicon on insulator (SOI) substrates

This paper details the application of phosphorus monolayer doping of silicon on insulator substrates. There have been no previous publications dedicated to the topic of MLD on SOI, which allows for the impact of reduced substrate dimensions to be probed. The doping was done through functionalization...

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Vydáno v:Beilstein J Nanotechnol
Hlavní autoři: Kennedy, Noel, Duffy, Ray, Eaton, Luke, O’Connell, Dan, Monaghan, Scott, Garvey, Shane, Connolly, James, Hatem, Chris, Holmes, Justin D, Long, Brenda
Médium: Artigo
Jazyk:Inglês
Vydáno: Beilstein-Institut 2018
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On-line přístup:https://ncbi.nlm.nih.gov/pmc/articles/PMC6122086/
https://ncbi.nlm.nih.gov/pubmed/30202683
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.199
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