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Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, proc...
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| Publicado no: | Sensors (Basel) |
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| Main Authors: | , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2018
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6022188/ https://ncbi.nlm.nih.gov/pubmed/29865261 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s18061797 |
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