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SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions
A procedure has been established to define the interface position in depth profiles accurately when using secondary ion mass spectrometry and the negative secondary ions. The interface position varies strongly with the extent of the matrix effect and so depends on the secondary ion measured. Intensi...
में बचाया:
| में प्रकाशित: | J Am Soc Mass Spectrom |
|---|---|
| मुख्य लेखकों: | , , , |
| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
Springer US
2018
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| विषय: | |
| ऑनलाइन पहुंच: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5889422/ https://ncbi.nlm.nih.gov/pubmed/29468500 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s13361-018-1905-2 |
| टैग : |
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