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SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions
A procedure has been established to define the interface position in depth profiles accurately when using secondary ion mass spectrometry and the negative secondary ions. The interface position varies strongly with the extent of the matrix effect and so depends on the secondary ion measured. Intensi...
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| Publicado no: | J Am Soc Mass Spectrom |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer US
2018
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5889422/ https://ncbi.nlm.nih.gov/pubmed/29468500 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s13361-018-1905-2 |
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