Intercalation of Si between MoS(2) layers

We report a combined experimental and theoretical study of the growth of sub-monolayer amounts of silicon (Si) on molybdenum disulfide (MoS(2)). At room temperature and low deposition rates we have found compelling evidence that the deposited Si atoms intercalate between the MoS(2) layers. Our evide...

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Bibliografiska uppgifter
I publikationen:Beilstein J Nanotechnol
Huvudupphovsmän: van Bremen, Rik, Yao, Qirong, Banerjee, Soumya, Cakir, Deniz, Oncel, Nuri, Zandvliet, Harold J W
Materialtyp: Artigo
Språk:Inglês
Publicerad: Beilstein-Institut 2017
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Full Research Paper
Länkar:https://ncbi.nlm.nih.gov/pmc/articles/PMC5629401/
https://ncbi.nlm.nih.gov/pubmed/29046843
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.8.196
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