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Fast and slow transient charging of Oxide Semiconductor Transistors

The comprehension of the governing mechanism which affects device instability is one of the most important requirements for the formation of reliable oxide-thin film transistors (TFTs). However, a quantitative analysis of the dominant mechanism of device instability, which stems from charge trapping...

Täydet tiedot

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Bibliografiset tiedot
Julkaisussa:Sci Rep
Päätekijät: Kim, Taeho, Park, Sungho, Jeon, Sanghun
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: Nature Publishing Group UK 2017
Aiheet:
Linkit:https://ncbi.nlm.nih.gov/pmc/articles/PMC5605542/
https://ncbi.nlm.nih.gov/pubmed/28928390
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-017-12155-3
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